Jiangsu Profile
Product List
21091. Premium Km Acetylene for Reliable Welding and Cutting Solutions 
[Jul 14, 2026]
[Jul 14, 2026] Specification: Physical Index Purity 99.95% Application 1. Ripening UN UN1962 2. API CAS 74-85-1 3. Refrigerant EINECS 200-815-3 Specification ≥99.999% O2 <0.5ppm N2 <2ppm H2O ...
21092. Competitive Pricing on Industrial Acetylene for Global Trade [Jul 14, 2026]
[Jul 14, 2026] Specification: Physical Index Purity 99.95% Application 1. Ripening UN UN1962 2. API CAS 74-85-1 3. Refrigerant EINECS 200-815-3 Specification ≥99.999% O2 <0.5ppm N2 <2ppm H2O ...
21093. Premium Industrial Ethane C2h6 Gas for Global Sales [Jul 14, 2026]
[Jul 14, 2026] Product Information Ethane is an organic chemical compound with chemical formula C2H6. At standard temperature and pressure, ethane is a colorless, odorless gas. Like many hydrocarbons, ethane is isolated on an ...
21094. Reliable 3n Carbon Monoxide Gas Monitor for Home Use [Jul 14, 2026]
[Jul 14, 2026] Specification: CAS No.: 630-08-0 EINECS No.: 211-128-3 UN No.: UN1016 Purity: 99.5%-99.99% Dot Class: 2.1 & 2.3 Appearance: Colorless Grade Standard: Industrial Grade Product ...
21095. High Purity 5n Tetramethylsilane for Industrial Chemical Use [Jul 14, 2026]
[Jul 14, 2026] Product Description: Tetramethylsilane - ( (CH3)4Si ) A flammable, colorless, odorless liquid. The COA of Product: Test Items Unit Test Results Purity Si(CH3)4(ICP-MS) % >99.99999 ...
21096. Premium Quality Nitric Oxide Gas 99.9% for Industrial Use [Jul 14, 2026]
[Jul 14, 2026] Product Information Product Name Nitric Oxide NO Chemical Formula NO Hazard Class 2.3 Molecular Weight 30.006 Boiling Point (ºC) -151.77 Boiling Point ...
21097. Ultra-Pure Electronic Grade Ethylene Gas 99.999% for Industry [Jul 14, 2026]
[Jul 14, 2026] Product Description Ethylene is an organic compound which is a colorless flammable gas with a faint sweet and musky odor when pure. It is a hydrocarbon with a formula C2H4. The molecular mass of Ethylene is ...
21098. Ultra High Purity 99.999% 5n Hydrobromide for Global Distribution [Jul 14, 2026]
[Jul 14, 2026] Product Information Hydrogen bromide is used in combination with hydrogen chloride and chlorine for plasma etching of polysilicon as STI /Silicon fin etch in FinFET or Trigate, silicon gate stack etch, and small ...
21099. High-Performance 3n Carbon Monoxide Gas Detector for Safety [Jul 14, 2026]
[Jul 14, 2026] Specification: CAS No.: 630-08-0 EINECS No.: 211-128-3 UN No.: UN1016 Purity: 99.5%-99.99% Dot Class: 2.1 & 2.3 Appearance: Colorless Grade Standard: Industrial Grade Product ...
21100. Reliable Carbon Monoxide Gas Monitor for Safety and Protection [Jul 14, 2026]
[Jul 14, 2026] Specification: CAS No.: 630-08-0 EINECS No.: 211-128-3 UN No.: UN1016 Purity: 99.5%-99.99% Dot Class: 2.1 & 2.3 Appearance: Colorless Grade Standard: Industrial Grade Product ...
21101. Premium 5n High Purity Ammonia Gas for Chemical Applications [Jul 14, 2026]
[Jul 14, 2026] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
21102. Premium Quality 5n Ammonia Gas for Chemical Applications [Jul 14, 2026]
[Jul 14, 2026] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
21103. Ultra High Purity Ammonia 99.999% 5n Specialty Gas [Jul 14, 2026]
[Jul 14, 2026] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
21104. Premium Grade 5n Ammonia Gas 99.999% for Chemical Applications [Jul 14, 2026]
[Jul 14, 2026] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
21105. Premium Quality 5n High Purity Ammonia Gas for Laboratories [Jul 14, 2026]
[Jul 14, 2026] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
