Jiangsu Profile
Product List
21841. Ultra-Pure Hexafluorobutadiene Gas 4.5n 99.995% for Industrial Use 
[Jul 14, 2026]
[Jul 14, 2026] C4F6:Perfluorobutadiene, also known as hexafluor-1, 3-butadiene, is a chemical i ntermediate. Specifications: Contaminants Specifications Nitrogen ≤5.0 ppm Oxygen+Argon ≤5.0 ppm Carbon ...
21842. Premium Quality 5n Hydrochloride Gas 99.999% for Global Distribution [Jul 14, 2026]
[Jul 14, 2026] Product information: Hydrogen chloride mediates the growth of epitaxial films of silicon, germanium, and III-V materials; it is also used to remove surface oxides and to etch metallic thin ...
21843. Premium 5n Krypton Gas - Electronic Grade Quality [Jul 14, 2026]
[Jul 14, 2026] 1,Description A rare gas that is odorless, colorless, tasteless, and in small quantities. Krypton forms one millionth of the atmosphere and is obtained in the production of liquid air. 2. Physical Properties ...
21844. Semiconductor Quality Hexafluorobutadiene Gas 99.995% for Global Distribution [Jul 14, 2026]
[Jul 14, 2026] C4F6:Perfluorobutadiene, also known as hexafluor-1, 3-butadiene, is a chemical i ntermediate. Specifications: Contaminants Specifications Nitrogen ≤5.0 ppm Oxygen+Argon ≤5.0 ppm Carbon ...
21845. Ultra High Purity 99.999% 5n Hydrochloride Gas for Industrial Use [Jul 14, 2026]
[Jul 14, 2026] Product information: Hydrogen chloride mediates the growth of epitaxial films of silicon, germanium, and III-V materials; it is also used to remove surface oxides and to etch metallic thin ...
21846. Premium Quality 5n Hydrochloride Gas with 99.999% Purity [Jul 14, 2026]
[Jul 14, 2026] Product information: Hydrogen chloride mediates the growth of epitaxial films of silicon, germanium, and III-V materials; it is also used to remove surface oxides and to etch metallic thin ...
21847. Premium 5n Ethylene Gas C2h4 for Electronics Manufacturing [Jul 14, 2026]
[Jul 14, 2026] Product Description Ethylene is an organic compound which is a colorless flammable gas with a faint sweet and musky odor when pure. It is a hydrocarbon with a formula C2H4. The molecular mass of Ethylene is ...
21848. Premium Quality 5n Ethylene Gas for Electronic Applications [Jul 14, 2026]
[Jul 14, 2026] Product Description Ethylene is an organic compound which is a colorless flammable gas with a faint sweet and musky odor when pure. It is a hydrocarbon with a formula C2H4. The molecular mass of Ethylene is ...
21849. Top Quality Electronic Grade C2h4 Ethylene Gas 99.999% Supply [Jul 14, 2026]
[Jul 14, 2026] Product Description Ethylene is an organic compound which is a colorless flammable gas with a faint sweet and musky odor when pure. It is a hydrocarbon with a formula C2H4. The molecular mass of Ethylene is ...
21850. High Purity 99.999% Ethylene Gas C2h4 for Electronics Manufacturing [Jul 14, 2026]
[Jul 14, 2026] Product Description Ethylene is an organic compound which is a colorless flammable gas with a faint sweet and musky odor when pure. It is a hydrocarbon with a formula C2H4. The molecular mass of Ethylene is ...
21851. Ultra High Purity 99.999% Hydrochloride Gas for Industrial Use [Jul 14, 2026]
[Jul 14, 2026] Product information: Hydrogen chloride mediates the growth of epitaxial films of silicon, germanium, and III-V materials; it is also used to remove surface oxides and to etch metallic thin ...
21852. Semiconductor Grade Boron Trichloride Gas, 5n Purity Level [Jul 14, 2026]
[Jul 14, 2026] Boron trifluoride:It is a colorless gas at room temperature and smokes in humid air. It's a very common Lewis acid, and it's also used to make other boron ...
21853. Ultra High Purity 99.999% 5n Hydrochloride Gas for Industrial Use2. [Jul 14, 2026]
[Jul 14, 2026] Product information: Hydrogen chloride mediates the growth of epitaxial films of silicon, germanium, and III-V materials; it is also used to remove surface oxides and to etch metallic thin ...
21854. Premium 99.999% High Purity Ammonia Gas for Laboratories [Jul 14, 2026]
[Jul 14, 2026] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
21855. High Grade 99.999% Ammonia Gas for Chemical Manufacturing [Jul 14, 2026]
[Jul 14, 2026] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
