Jiangsu Profile
Product List
5596. High Purity Customizable Tetramethylsilane C4h12si for Industrial Applications 
[Sep 03, 2026]
[Sep 03, 2026] Product Description: Tetramethylsilane - ( (CH3)4Si ) A flammable, colorless, odorless liquid. The COA of Product: Test Items Unit Test Results Purity Si(CH3)4(ICP-MS) % >99.99999 ...
5597. Premium 5n Ammonia Supply - Ultra Pure Industrial Gas [Sep 03, 2026]
[Sep 03, 2026] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
5598. Premium Kaimei 99.999% Bf3 Gas - Available in 2L, 2.2L, 4L [Sep 03, 2026]
[Sep 03, 2026] Boron trifluoride:It is a colorless gas at room temperature and smokes in humid air. It's a very common Lewis acid, and it's also used to make other boron ...
5599. Premium Boron Trichloride Gas for Advanced Chip Production [Sep 03, 2026]
[Sep 03, 2026] Boron trifluoride:It is a colorless gas at room temperature and smokes in humid air. It's a very common Lewis acid, and it's also used to make other boron ...
5600. Premium Grade Boron Trichloride Bf3 Gas 99.999% Purity [Sep 03, 2026]
[Sep 03, 2026] Boron trifluoride:It is a colorless gas at room temperature and smokes in humid air. It's a very common Lewis acid, and it's also used to make other boron ...
5601. Ultra-Pure Semiconductor Grade Boron Trichloride Gas for Electronics [Sep 03, 2026]
[Sep 03, 2026] Boron trifluoride:It is a colorless gas at room temperature and smokes in humid air. It's a very common Lewis acid, and it's also used to make other boron ...
5602. Premium Quality 20L Cylinder of Suzhou Nitrogen Trifluoride Gas [Sep 03, 2026]
[Sep 03, 2026] Production: It is used as fluorine source for high energy chemical laser of hydrogen fluoride and fluoride gas. It is an excellent plasma etching gas in the microelectronics industry. It is the class 2.2 toxic gas, ...
5603. Specialty NF3 Gas for Advanced Electronics Manufacturing Needs [Sep 03, 2026]
[Sep 03, 2026] It is used as fluorine source for high energy chemical laser of hydrogen fluoride and fluoride gas. It is an excellent plasma etching gas in the microelectronics industry. It is the class 2.2 toxic gas, and its maximum ...
5604. Versatile Perfluorocyclobutane Gas for Precision Etching and Control [Sep 03, 2026]
[Sep 03, 2026] Octafluorocyclobutane is an etching agent. Characteristics: Colorless gas with characteristic mouldy odor. Highly oxidizing at increased temperatures, can then ignite organic material. Gas density heavier than air ...
5605. Ultra High Purity 99.999% Ethylene Gas for Electronics [Sep 03, 2026]
[Sep 03, 2026] Product Description Ethylene is an organic compound which is a colorless flammable gas with a faint sweet and musky odor when pure. It is a hydrocarbon with a formula C2H4. The molecular mass of Ethylene is ...
5606. Premium Grade Ammonia 99.999% for Chemical Production Needs [Sep 03, 2026]
[Sep 03, 2026] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
5607. Premium Quality NF3 Gas for Industrial Applications 99.996% [Sep 03, 2026]
[Sep 03, 2026] It is used as fluorine source for high energy chemical laser of hydrogen fluoride and fluoride gas. It is an excellent plasma etching gas in the microelectronics industry. It is the class 2.2 toxic gas, and its maximum ...
5608. Premium High-Purity Ethylene Gas C2h4 for Industrial Use [Sep 03, 2026]
[Sep 03, 2026] Product Description Ethylene is an organic compound which is a colorless flammable gas with a faint sweet and musky odor when pure. It is a hydrocarbon with a formula C2H4. The molecular mass of Ethylene is ...
5609. Reliable Acetylene Gas C2h2 Solutions for Worldwide Buyers [Sep 03, 2026]
[Sep 03, 2026] Specification: Physical Index Purity 99.95% Application 1. Ripening UN UN1962 2. API CAS 74-85-1 3. Refrigerant EINECS 200-815-3 Specification ≥99.999% O2 <0.5ppm N2 <2ppm H2O ...
5610. High Purity NF3 Gas 40L for Semiconductor Applications [Sep 03, 2026]
[Sep 03, 2026] Nitrogen trifluoride is an etchant and chamber cleaning agent. Product Specifications It is used as fluorine source for high energy chemical laser of hydrogen fluoride and fluoride gas. It is an excellent plasma ...
