Jiangsu Profile
Product List
5851. Premium Kaimei 99.999% Bf3 Gas - Available in 2L, 2.2L, 4L 
[Oct 29, 2026]
[Oct 29, 2026] Boron trifluoride:It is a colorless gas at room temperature and smokes in humid air. It's a very common Lewis acid, and it's also used to make other boron ...
5852. Premium Boron Trichloride Gas for Advanced Chip Production [Oct 29, 2026]
[Oct 29, 2026] Boron trifluoride:It is a colorless gas at room temperature and smokes in humid air. It's a very common Lewis acid, and it's also used to make other boron ...
5853. Premium Grade Boron Trichloride Bf3 Gas 99.999% Purity [Oct 29, 2026]
[Oct 29, 2026] Boron trifluoride:It is a colorless gas at room temperature and smokes in humid air. It's a very common Lewis acid, and it's also used to make other boron ...
5854. Premium Boron Trichloride Bf3 99.999% for Electronics Manufacturing [Oct 29, 2026]
[Oct 29, 2026] Boron trifluoride:It is a colorless gas at room temperature and smokes in humid air. It's a very common Lewis acid, and it's also used to make other boron ...
5855. High-Purity 5n Ammonia Gas Nh3 99.999% for Industrial Use [Oct 29, 2026]
[Oct 29, 2026] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
5856. Premium 5n Ammonia Supply - Ultra Pure Industrial Gas [Oct 29, 2026]
[Oct 29, 2026] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
5857. Ultra High Purity Ammonia Gas 99.999% for Research [Oct 29, 2026]
[Oct 29, 2026] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
5858. Superior Quality 99.999% Ammonia Gas for Chemical Use [Oct 29, 2026]
[Oct 29, 2026] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
5859. Premium Grade Ammonia 99.999% for Chemical Production Needs [Oct 29, 2026]
[Oct 29, 2026] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
5860. High-Purity 99.9% Ammonia Nh3 Gas for Refrigeration Needs [Oct 29, 2026]
[Oct 29, 2026] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
5861. High-Purity Kaimei Electronic Grade Bcl3 Gas Cylinder 47L [Oct 29, 2026]
[Oct 29, 2026] Dangerous chemicals. Mainly used as semicond- uctor silicon doping source or organic synthesis catalyst, but also used in high purity boron or organoborate preparation. It is harmful to human health if inhaled, taken ...
5862. Premium Quality NF3 Gas for Industrial Applications 99.996% [Oct 29, 2026]
[Oct 29, 2026] It is used as fluorine source for high energy chemical laser of hydrogen fluoride and fluoride gas. It is an excellent plasma etching gas in the microelectronics industry. It is the class 2.2 toxic gas, and its maximum ...
5863. High Purity NF3 Gas 40L for Semiconductor Applications [Oct 29, 2026]
[Oct 29, 2026] Nitrogen trifluoride is an etchant and chamber cleaning agent. Product Specifications It is used as fluorine source for high energy chemical laser of hydrogen fluoride and fluoride gas. It is an excellent plasma ...
5864. Premium Quality 20L Cylinder of Suzhou Nitrogen Trifluoride Gas [Oct 29, 2026]
[Oct 29, 2026] Production: It is used as fluorine source for high energy chemical laser of hydrogen fluoride and fluoride gas. It is an excellent plasma etching gas in the microelectronics industry. It is the class 2.2 toxic gas, ...
5865. Specialty NF3 Gas for Advanced Electronics Manufacturing Needs [Oct 29, 2026]
[Oct 29, 2026] It is used as fluorine source for high energy chemical laser of hydrogen fluoride and fluoride gas. It is an excellent plasma etching gas in the microelectronics industry. It is the class 2.2 toxic gas, and its maximum ...
