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5776. Premium High Gloss Ral Colors for Durable Outdoor Powder Coating Paint 
[Oct 13, 2026]
[Oct 13, 2026] Product Details DESCRIPTION High gloss powder coating is a solvent-free powder-based type of coating used commonly to coat metals for a wide range of applications, such as in automotive industry. The surface ...
5777. Premium 99.999% Ammonia Gas for Industrial Applications Worldwide [Oct 29, 2026]
[Oct 29, 2026] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Package Specifications: Package Volume Weight Valve connection Cylinder 47L 20KG CGA660,DISS720 Y-CYL 440L 230KG DISS ...
5778. High Purity 99.999% Ammonia Gas - Kaimei Brand 470L [Oct 29, 2026]
[Oct 29, 2026] Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 < 0.5 0.1 0.01 N2(VOF)/10-6 < 1 - 0.01 CO(VOF)/10-6 ...
5779. High Purity 5n Ammonia Gas for Industrial Chemicals [Oct 29, 2026]
[Oct 29, 2026] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 < 0.5 0.1 0.01 N2(VOF)/10-6 < 1 ...
5780. Premium 5n Ammonia Gas for Industrial Chemical Solutions [Oct 29, 2026]
[Oct 29, 2026] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
5781. High Purity 5n Ammonia Gas for Laboratory Use [Oct 29, 2026]
[Oct 29, 2026] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
5782. Premium 5n Ammonia Gas Nh3 99.999% for Industrial Use [Oct 29, 2026]
[Oct 29, 2026] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
5783. Ultra Pure 99.999% Ammonia Gas Nh3 - 47L Cylinder From Suzhou [Oct 29, 2026]
[Oct 29, 2026] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
5784. High-Quality 5n Ammonia Gas 99.999% for Chemical Synthesis [Oct 29, 2026]
[Oct 29, 2026] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
5785. Premium 99.999% Ammonia Gas for Global Export and Distribution [Oct 29, 2026]
[Oct 29, 2026] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
5786. Ultra High Purity Ammonia 99.999% for Global Industry Use [Oct 29, 2026]
[Oct 29, 2026] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
5787. Ultra-Pure 5n Ammonia Gas 99.999% for Lab Research [Oct 29, 2026]
[Oct 29, 2026] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
5788. High-Purity 99.9% Ammonia Nh3 Refrigerant R717 for Industrial Applications [Oct 29, 2026]
[Oct 29, 2026] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Package Specifications: Package Volume Weight Valve connection Cylinder 47L 20KG CGA660,DISS720 Y-CYL 440L 230KG DISS ...
5789. High Purity 5n Ammonia Gas for Scientific Research Labs [Oct 29, 2026]
[Oct 29, 2026] Ammonia is a nitrogen precursor for silicon nitride and metal nitride thin films. Product Specifications: Ammonia 99.9995% 99.99994% 99.99999% H2(VOF)/10-6 < 0.5 0.1 0.01 O2+Ar(VOF)/10-6 ...
5790. High-Purity CF4 99.999% Carbon Tetrafluoride for Industrial Applications [Oct 29, 2026]
[Oct 29, 2026] Product Information Tetrafluoromethane is used in the electronics industry for plasma degreasing of multilayer printed circuit boards. Product specification Product Name Carbon ...
