Jiangsu Profile
Product List
3451. High Purity Hcds 5n Hexachlorodisilane for Semiconductor CVD Deposition Processes 
[Oct 29, 2026]
[Oct 29, 2026] Product Description Parameter Typical Value Parameter Reference Maximum Limit Total Metal Impurities ≤50 ppb Chromium (Cr) ≤5 ppb Iron (Fe) ≤5 ppb Nickel (Ni) ≤5 ppb Aluminum (Al) ≤5 ppb Zinc (Zn) ≤10 ppb Copper (Cu) ≤2 ...
3452. Hexachlorodisilane Si2cl6 5n Semiconductor Precursor for Ald CVD Lpcvd Deposition [Oct 29, 2026]
[Oct 29, 2026] Product Description Parameter Typical Value Parameter Reference Maximum Limit Total Metal Impurities ≤50 ppb Chromium (Cr) ≤5 ppb Iron (Fe) ≤5 ppb Nickel (Ni) ≤5 ppb Aluminum (Al) ≤5 ppb Zinc (Zn) ≤10 ppb Copper (Cu) ≤2 ...
3453. 5n Semiconductor Grade Hexachlorodisilane Hcds Precursor for CVD and Lpcvd [Oct 29, 2026]
[Oct 29, 2026] Product Description Parameter Typical Value Parameter Reference Maximum Limit Total Metal Impurities ≤50 ppb Chromium (Cr) ≤5 ppb Iron (Fe) ≤5 ppb Nickel (Ni) ≤5 ppb Aluminum (Al) ≤5 ppb Zinc (Zn) ≤10 ppb Copper (Cu) ≤2 ...
3454. Hexachlorodisilane Supplier 5n Hcds for Semiconductor Ald CVD Deposition [Oct 29, 2026]
[Oct 29, 2026] Product Description Parameter Typical Value Parameter Reference Maximum Limit Total Metal Impurities ≤50 ppb Chromium (Cr) ≤5 ppb Iron (Fe) ≤5 ppb Nickel (Ni) ≤5 ppb Aluminum (Al) ≤5 ppb Zinc (Zn) ≤10 ppb Copper (Cu) ≤2 ...
3455. Hexachlorodisilane Supplier Hcds 5n 99 999% High Purity Semiconductor Ald CVD Precursor [Oct 29, 2026]
[Oct 29, 2026] Product Description Parameter Typical Value Parameter Reference Maximum Limit Total Metal Impurities ≤50 ppb Chromium (Cr) ≤5 ppb Iron (Fe) ≤5 ppb Nickel (Ni) ≤5 ppb Aluminum (Al) ≤5 ppb Zinc (Zn) ≤10 ppb Copper (Cu) ≤2 ...
3456. High Purity Si2cl6 Hexachlorodisilane 99 999% Semiconductor Grade Precursor [Oct 29, 2026]
[Oct 29, 2026] Product Description Parameter Typical Value Parameter Reference Maximum Limit Total Metal Impurities ≤50 ppb Chromium (Cr) ≤5 ppb Iron (Fe) ≤5 ppb Nickel (Ni) ≤5 ppb Aluminum (Al) ≤5 ppb Zinc (Zn) ≤10 ppb Copper (Cu) ≤2 ...
3457. 99 999% Hcds Si2cl6 High Purity Hexachlorodisilane Semiconductor Precursor [Oct 29, 2026]
[Oct 29, 2026] Product Description Parameter Typical Value Parameter Reference Maximum Limit Total Metal Impurities ≤50 ppb Chromium (Cr) ≤5 ppb Iron (Fe) ≤5 ppb Nickel (Ni) ≤5 ppb Aluminum (Al) ≤5 ppb Zinc (Zn) ≤10 ppb Copper (Cu) ≤2 ...
3458. Hexachlorodisilane Si2cl6 5n High Purity Precursor for Semiconductor Deposition [Oct 29, 2026]
[Oct 29, 2026] Product Description Parameter Typical Value Parameter Reference Maximum Limit Total Metal Impurities ≤50 ppb Chromium (Cr) ≤5 ppb Iron (Fe) ≤5 ppb Nickel (Ni) ≤5 ppb Aluminum (Al) ≤5 ppb Zinc (Zn) ≤10 ppb Copper (Cu) ≤2 ...
3459. Premium Industrial Acetylene C2h2 Gas for Sale Worldwide in 20L/40L/280L [Oct 29, 2026]
[Oct 29, 2026] Specification: Physical Index Purity 99.95% Application 1. Ripening UN UN1962 2. API CAS 74-85-1 3. Refrigerant EINECS 200-815-3 Specification ≥99.999% O2 <0.5ppm N2 <2ppm H2O ...
3460. Reliable Supply of 40L Premium Acetylene Gas for Industrial Use [Oct 29, 2026]
[Oct 29, 2026] Specification: Physical Index Purity 99.95% Application 1. Ripening UN UN1962 2. API CAS 74-85-1 3. Refrigerant EINECS 200-815-3 Specification ≥99.999% O2 <0.5ppm N2 <2ppm H2O ...
3461. Premium Quality Helium Gas 99.999% for Scientific Applications [Oct 29, 2026]
[Oct 29, 2026] Helium:Usually a colorless, odorless gas, it is the only substance that cannot cure at standard atmospheric pressure. Helium is the least reactive element. It is mainly used as protective gas, working fluid of gas - ...
3462. High Purity Helium Gas 99.999% for Medical and Research [Oct 29, 2026]
[Oct 29, 2026] Helium:Usually a colorless, odorless gas, it is the only substance that cannot cure at standard atmospheric pressure. Helium is the least reactive element. It is mainly used as protective gas, working fluid of gas - ...
3463. Top-Quality 99 9999% Ammonia Gas for Advanced Etching Processes [Oct 29, 2026]
[Oct 29, 2026] Ammonia Ammonia is a vital nitrogen source pivotal in forming silicon nitride and metal nitride thin films, key components in cutting-edge technological breakthroughs. Package Specifications: Package Volume Weight Valve ...
3464. Premium 99 999% High-Purity Ammonia Nh3 Refrigerant for Industrial Applications [Oct 29, 2026]
[Oct 29, 2026] Ammonia Ammonia serves as an indispensable nitrogen precursor, pivotal in the synthesis of silicon nitride and metal nitride thin films, which are crucial for advanced technological applications. Package ...
3465. Quality Liquid Ammonia R717 99 9% for Industrial Applications in China [Oct 29, 2026]
[Oct 29, 2026] Ammonia serves as an essential nitrogen precursor, playing a pivotal role in the creation of silicon nitride and metal nitride thin films, which are integral to various high-tech applications. Package ...
