Jiangsu Profile
Product List
3286. Industrial O3 Monitor Ozone Gas Detector Leak Detector Plug and Play Sensor 
[Oct 23, 2026]
[Oct 23, 2026] Product specifications Detection gas Combustible gas Toxic gas Common gas types LPG, Natural, Methane(CH4), Butane, Ethane, Propane, Ethanol, Isobutane, Nbutane, etc. H2S, CO, O2, NH3, H2, HCL, CO2, CL2, SO2, O3, C2H4, ...
3287. Advanced Surfactant Factory Sunly 1831 (OTAC/STAC/TC-8) CAS 112-03-8 70% Available in China [Oct 09, 2026]
[Oct 09, 2026] Product Description High-Grade Octadecyl (Stearyl) Trimethyl Ammonium Chloride 1831 (OTAC/STAC/TC-8) Product Introduction: Octadecyl (Stearyl) Trimethyl Ammonium Chloride is a premier cationic surfactant, typically ...
3288. Powerful 40% Didecyl Dimethyl Ammonium Disinfectant for Surfaces [Oct 09, 2026]
[Oct 09, 2026] Product Description Didecyl dimethyl ammonium chloride D1021(DDAC) Didecyl dimethyl ammonium chloride (DDAC) is a cationic quaternary ammonium salt surfactant, CAS 7173-51-5. Known for potent bactericidal and algaecidal ...
3289. Efficient Didecyl Dimethyl Ammonium Chloride 50% - Reliable Source From China [Oct 09, 2026]
[Oct 09, 2026] Product Description Didecyl dimethyl ammonium chloride D1021(DDAC) Didecyl dimethyl ammonium chloride (DDAC), also known as didecyldimethylammonium chloride, n-didecyldimethylammonium chloride, and didecyl dimethyl ...
3290. Premium Didecyl Dimethyl Ammonium Chloride 70% From China [Oct 09, 2026]
[Oct 09, 2026] Product Description Didecyl dimethyl ammonium chloride D1021(DDAC) Didecyl dimethyl ammonium chloride (DDAC), also known as didecyldimethylammonium chloride, n-didecyldimethylammonium chloride, and didecyl dimethyl ...
3291. Diffusion Sampling So2 Leak Detection Gas Detector with Visible and Sight Light [Oct 21, 2026]
[Oct 21, 2026] Product specifications Detection gas Combustible gas Toxic gas Common gas types LPG, Natural, Methane(CH4), Butane, Ethane, Propane, Ethanol, Isobutane, Nbutane, etc. H2S, CO, O2, NH3, H2, HCL, CO2, CL2, SO2, O3, C2H4, ...
3292. ATEX Certified Chlorine Dioxide Sensor 4-20mA Output for Industial Coal Mine Monit [Oct 21, 2026]
[Oct 21, 2026] Product specifications Detection gas Combustible gas Toxic gas Common gas types LPG, Natural, Methane(CH4), Butane, Ethane, Propane, Ethanol, Isobutane, Nbutane, etc. H2S, CO, O2, NH3, H2, HCL, CO2, CL2, SO2, O3, C2H4, ...
3293. Wall Mounted Nh3 Gas Detector Leak Detection for Industrial Cold Storage Use [Oct 21, 2026]
[Oct 21, 2026] Product specifications Detection gas Combustible gas Toxic gas Common gas types LPG, Natural, Methane(CH4), Butane, Ethane, Propane, Ethanol, Isobutane, Nbutane, etc. H2S, CO, O2, NH3, H2, HCL, CO2, CL2, SO2, O3, C2H4, ...
3294. High Purity 5n Hexachlorodisilane Hcds Semiconductor Ald CVD Lpcvd Precursor Si2cl6 [Oct 29, 2026]
[Oct 29, 2026] Product Description Parameter Typical Value Parameter Reference Maximum Limit Total Metal Impurities ≤50 ppb Chromium (Cr) ≤5 ppb Iron (Fe) ≤5 ppb Nickel (Ni) ≤5 ppb Aluminum (Al) ≤5 ppb Zinc (Zn) ≤10 ppb Copper (Cu) ≤2 ...
3295. High Purity 5n Hexachlorodisilane Hcds Semiconductor Precursor for Ald CVD [Oct 29, 2026]
[Oct 29, 2026] Product Description Parameter Typical Value Parameter Reference Maximum Limit Total Metal Impurities ≤50 ppb Chromium (Cr) ≤5 ppb Iron (Fe) ≤5 ppb Nickel (Ni) ≤5 ppb Aluminum (Al) ≤5 ppb Zinc (Zn) ≤10 ppb Copper (Cu) ≤2 ...
3296. Semiconductor Grade Hexachlorodisilane Si2Cl6 for Atomic Layer Deposition and CVD [Oct 29, 2026]
[Oct 29, 2026] Product Description Parameter Typical Value Parameter Reference Maximum Limit Total Metal Impurities ≤50 ppb Chromium (Cr) ≤5 ppb Iron (Fe) ≤5 ppb Nickel (Ni) ≤5 ppb Aluminum (Al) ≤5 ppb Zinc (Zn) ≤10 ppb Copper (Cu) ≤2 ...
3297. HCDS for CVD LPCVD ALD 5N 99 999% Hexachlorodisilane Semiconductor Precursor [Oct 29, 2026]
[Oct 29, 2026] Product Description Parameter Typical Value Parameter Reference Maximum Limit Total Metal Impurities ≤50 ppb Chromium (Cr) ≤5 ppb Iron (Fe) ≤5 ppb Nickel (Ni) ≤5 ppb Aluminum (Al) ≤5 ppb Zinc (Zn) ≤10 ppb Copper (Cu) ≤2 ...
3298. Hcds Ald Precursor Hexachlorodisilane CAS 13465-77-5 for Semiconductor Deposition [Oct 29, 2026]
[Oct 29, 2026] Product Description Parameter Typical Value Parameter Reference Maximum Limit Total Metal Impurities ≤50 ppb Chromium (Cr) ≤5 ppb Iron (Fe) ≤5 ppb Nickel (Ni) ≤5 ppb Aluminum (Al) ≤5 ppb Zinc (Zn) ≤10 ppb Copper (Cu) ≤2 ...
3299. Semiconductor Precursor HCDS 5N Hexachlorodisilane Si2Cl6 for ALD CVD LPCVD [Oct 29, 2026]
[Oct 29, 2026] Product Description Parameter Typical Value Parameter Reference Maximum Limit Total Metal Impurities ≤50 ppb Chromium (Cr) ≤5 ppb Iron (Fe) ≤5 ppb Nickel (Ni) ≤5 ppb Aluminum (Al) ≤5 ppb Zinc (Zn) ≤10 ppb Copper (Cu) ≤2 ...
3300. High Purity HCDS 5N Hexachlorodisilane Semiconductor Precursor for ALD and CVD [Oct 29, 2026]
[Oct 29, 2026] Product Description Parameter Typical Value Parameter Reference Maximum Limit Total Metal Impurities ≤50 ppb Chromium (Cr) ≤5 ppb Iron (Fe) ≤5 ppb Nickel (Ni) ≤5 ppb Aluminum (Al) ≤5 ppb Zinc (Zn) ≤10 ppb Copper (Cu) ≤2 ...
